Bismuth Resists for EUV Lithography

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

CiNii Research
Search Service
Digital
You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.
Check the holdings of this book

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 記事
Title: Bismuth Resists for EUV Lithography
Author/Editor: James Passarelli
Miriam Sortland
Ryan Del Re 他
Author Heading: James Passarelli
Miriam Sortland
Ryan Del Re
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 27(5):2014
Volume: 27
Issue: 5
Pages: 655-661
Publication date of volume/issue (W3CDTF): 2014
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: Bismuth
EUV
Photoresist
MORE
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 025604295
http://id.ndl.go.jp/bib/025604295
Bibliographic Record Category (NDL): 632