The Performances and Challenges of Today's EB Lithography and EB-resist Materials

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The Performances and Challenges of Today's EB Lithography and EB-resist Materials

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Material Type: 記事
Title: The Performances and Challenges of Today's EB Lithography and EB-resist Materials
Author/Editor: Masato Saito
Kunihiro Ugajin
Keisuke Yagawa 他
Author Heading: Masato Saito
Kunihiro Ugajin
Keisuke Yagawa
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 27(4):2014
Volume: 27
Issue: 4
Pages: 511-516
Publication date of volume/issue (W3CDTF): 2014
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: EB
mask
resist
proximity effect
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 025604418
http://id.ndl.go.jp/bib/025604418
Bibliographic Record Category (NDL): 632