ミスト化学気相成長法を用いた大気圧薄膜形成と酸化物機能デバイスのグリーンプロセス化

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Material Type: 記事
Title: ミスト化学気相成長法を用いた大気圧薄膜形成と酸化物機能デバイスのグリーンプロセス化
Author/Editor: 川原村敏幸
古田守
Author Heading: 川原村敏幸
古田守
Alternative Title: Mist chemical vapor deposition for thin-film deposition at atmospheric pressure to move toward a green process for oxide-based electronics
Periodical title: 応用物理
No. or year of volume/issue: 83(9):2014.9
Volume: 83
Issue: 9
Pages: 747-751
Publication date of volume/issue (W3CDTF): 2014-09
ISSN (Periodical Title): 0369-8009
ISSN-L (Periodical Title): 0369-8009
Publication (Periodical Title): 東京 : 応用物理学会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: Mist chemical vapor deposition
metal oxide
Ga₂O₃
Al₂O₃
InGaZnO
thin-film transistor
NDLC: ZM17
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z15-243
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 025793940
http://id.ndl.go.jp/bib/025793940
Bibliographic Record Category (NDL): 632