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雑誌　電子資料「センサ・マイクロマシンと応用システム」シンポジウム論文集
Volume number31:2014.10.20-22
ArticleAN OPTIMIZ...

AN OPTIMIZATION TOOL FOR 3D LITHOGRAPHY UTILIZING DMD-BASED MASKLESS EXPOSURE SYSTEM

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AN OPTIMIZATION TOOL FOR 3D LITHOGRAPHY UTILIZING DMD-BASED MASKLESS EXPOSURE SYSTEM

Call No. (NDL)
YH247-299
Bibliographic ID of National Diet Library
025916771
Material type
記事
Author
Xiaoxu Maほか
Publisher
[東京] : Institute of Electrical Engineers of Japan
Publication date
2014-10
Material Format
Recording Media
Journal name
「センサ・マイクロマシンと応用システム」シンポジウム論文集 電気学会センサ・マイクロマシン部門 [編] 31:2014.10.20-22
Publication Page
p.5p
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Recording Media

Material Type
記事
Title
AN OPTIMIZATION TOOL FOR 3D LITHOGRAPHY UTILIZING DMD-BASED MASKLESS EXPOSURE SYSTEM
Author/Editor
Xiaoxu Ma
Yoshiki Kato
Yoshikazu Hirai 他
Author Heading
Xiaoxu Ma
Yoshiki Kato
Yoshikazu Hirai
Periodical title
「センサ・マイクロマシンと応用システム」シンポジウム論文集 電気学会センサ・マイクロマシン部門 [編]
No. or year of volume/issue
31:2014.10.20-22
Volume
31
Pages
5p
Publication date of volume/issue (W3CDTF)
2014-10
Publication (Periodical Title)
[東京] : Institute of Electrical Engineers of Japan