Volume number31:2014.10.20-22
チタニウムウェハの貫...

チタニウムウェハの貫通加工のための熱反応性イオンエッチング法の開発

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チタニウムウェハの貫通加工のための熱反応性イオンエッチング法の開発

Call No. (NDL)
YH247-299
Bibliographic ID of National Diet Library
025922812
Material type
記事
Author
山田 周史ほか
Publisher
[東京] : Institute of Electrical Engineers of Japan
Publication date
2014-10
Material Format
Recording Media
Journal name
「センサ・マイクロマシンと応用システム」シンポジウム論文集 電気学会センサ・マイクロマシン部門 [編] 31:2014.10.20-22
Publication Page
p.1-4
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Recording Media

Material Type
記事
Author/Editor
山田 周史
南 佑人
寒川 雅之 他
Alternative Title
Thermal reactive ion etching for etching through titanium wafer
Periodical title
「センサ・マイクロマシンと応用システム」シンポジウム論文集 電気学会センサ・マイクロマシン部門 [編]
No. or year of volume/issue
31:2014.10.20-22
Volume
31
Pages
1-4
Publication date of volume/issue (W3CDTF)
2014-10