スパッタ堆積法による...

スパッタ堆積法によるSi/Geの低温高速エピタキシャル成長と太陽電池応用 (特集 次世代エネルギー技術開発の展望)

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スパッタ堆積法によるSi/Geの低温高速エピタキシャル成長と太陽電池応用

(特集 次世代エネルギー技術開発の展望)

Call No. (NDL)
Z17-54
Bibliographic ID of National Diet Library
026193749
Material type
記事
Author
葉 文昌
Publisher
東京 : 小峰工業出版
Publication date
2015-03
Material Format
Paper
Journal name
化學工業 66(3)=781:2015.3
Publication Page
p.198-205
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Paper

Material Type
記事
Author/Editor
葉 文昌
Author Heading
Alternative Title
High Speed Sputter Epitaxy of Si/Ge and its Application to Si Based Solar Cells
Periodical title
化學工業
No. or year of volume/issue
66(3)=781:2015.3
Volume
66
Issue
3