Etching Characteristics with Ar-Cl₂ Gas Mixed Cluster Ion Beam

Journal name: 兵庫県立大学工学研究科イオン工学研究室論文集 = Annual report of Ion Beam Engineering Laboratory, University of Hyogo 2010年度

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Material Type: 記事
Title: Etching Characteristics with Ar-Cl₂ Gas Mixed Cluster Ion Beam
Author/Editor: Toshio Seki
Takaaki Aoki
Jiro Matsuo
Author Heading: Toshio Seki
Takaaki Aoki
Jiro Matsuo
Periodical title: 兵庫県立大学工学研究科イオン工学研究室論文集 = Annual report of Ion Beam Engineering Laboratory, University of Hyogo
No. or year of volume/issue: 2010年度
Pages: 273-277
Publication date of volume/issue (W3CDTF): 2010
Publication (Periodical Title): 姫路 : 兵庫県立大学工学研究科イオン工学研究室
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: ZP5
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z74-E130
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 026978304
http://id.ndl.go.jp/bib/026978304
Bibliographic Record Category (NDL): 632