ラジカル支援原子層制御ナノプロセス (小特集原子を積んで膜をつくる : ALDプロセスの化学工学的展開)

ラジカル支援原子層制御ナノプロセス

(小特集原子を積んで膜をつくる : ALDプロセスの化学工学的展開)

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Material Type: 記事
Title: ラジカル支援原子層制御ナノプロセス
Author/Editor: 石川健治
小林明子
盧翌
竹田圭吾
近藤博基
関根誠
堀勝
Series Title: 小特集原子を積んで膜をつくる : ALDプロセスの化学工学的展開
Author Heading: 石川健治
小林明子
盧翌
竹田圭吾
近藤博基
関根誠
堀勝
Alternative Title: Radical Enhanced Atomic Layer-Level Metal-Organic Vapor Deposition
Periodical title: 化学工学 = Chemical engineering of Japan
No. or year of volume/issue: 80(7):2016.7
Volume: 80
Issue: 7
Pages: 424-427
Publication date of volume/issue (W3CDTF): 2016-07
ISSN (Periodical Title): 0375-9253
ISSN-L (Periodical Title): 0375-9253
Publication (Periodical Title): 東京 : 化学工学会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZP5
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z17-53
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 027518645
http://id.ndl.go.jp/bib/027518645
Bibliographic Record Category (NDL): 632