Volume number30(5):2017
Resist Inv...

Resist Investigation Method using ab initio MO Calculation on basis of Approximation Molecular Model

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Resist Investigation Method using ab initio MO Calculation on basis of Approximation Molecular Model

Call No. (NDL)
Z53-W515
Bibliographic ID of National Diet Library
028336384
Material type
記事
Author
Shohei Nagataほか
Publisher
Chiba : The Society of Photopolymer Science and Technology
Publication date
2017
Material Format
Paper
Journal name
Journal of photopolymer science and technology 30(5):2017
Publication Page
p.583-589
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Paper Digital

Material Type
記事
Author/Editor
Shohei Nagata
Shota Niihara
Tetsuo Harada
Takeo Watanabe
Periodical title
Journal of photopolymer science and technology
No. or year of volume/issue
30(5):2017
Volume
30
Issue
5
Pages
583-589
Publication date of volume/issue (W3CDTF)
2017