EUV Mechanistic Studies of Antimony Resists

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Material Type: 記事
Title: EUV Mechanistic Studies of Antimony Resists
Author/Editor: Michael Murphy
Amrit Narasimhan
Steven Grzeskowiak
Jacob Sitterly
Philip Schuler
Jeff Richards
Greg Denbeaux
Robert L. Brainard
Author Heading: Michael Murphy
Amrit Narasimhan
Steven Grzeskowiak
Jacob Sitterly
Philip Schuler
Jeff Richards
Greg Denbeaux
Robert L. Brainard
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 30(1):2017
Volume: 30
Issue: 1
Pages: 121-131
Publication date of volume/issue (W3CDTF): 2017
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: EUV
Photoresist
Outgassing
Mechanism
Antimony
Deuterium Labeling
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 028336519
http://id.ndl.go.jp/bib/028336519
Bibliographic Record Category (NDL): 632