触媒反応支援CVD法におけるパルスガス供給によるZnO結晶膜の単分子層成長制御 (電子部品・材料)

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触媒反応支援CVD法におけるパルスガス供給によるZnO結晶膜の単分子層成長制御

(電子部品・材料)

Call No. (NDL)
Z16-940
Bibliographic ID of National Diet Library
028443175
Material type
記事
Author
齋藤 太朗ほか
Publisher
東京 : 電子情報通信学会
Publication date
2017-07
Material Format
Paper
Journal name
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 117(148):2017.7.21・22
Publication Page
p.57-60
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Paper

Material Type
記事
Author/Editor
齋藤 太朗
小野 翔太郎
伊庭 竜太
安井 寛治
Alternative Title
Monomolecular layer growth control of ZnO films by pulse supply of a metal source gas in catalytic reaction-assisted chemical vapor deposition
Periodical title
電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue
117(148):2017.7.21・22
Volume
117
Issue
148