原子層堆積法の酸化ガ...

原子層堆積法の酸化ガスがAl₂O₃膜の電気特性へ及ぼす影響 (特集 2017年真空・表面科学合同講演会特集号(2))

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原子層堆積法の酸化ガスがAl₂O₃膜の電気特性へ及ぼす影響(特集 2017年真空・表面科学合同講演会特集号(2))

Call No. (NDL)
Z16-474
Bibliographic ID of National Diet Library
029114847
Material type
記事
Author
生田目 俊秀ほか
Publisher
東京 : 日本表面科学会 ; 2018-
Publication date
2018-05
Material Format
Paper
Journal name
表面と真空 = Vacuum and surface science / 日本表面科学会, 日本真空学会 編 61(5):2018.5
Publication Page
p.280-285
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Paper Digital

Material Type
記事
Author/Editor
生田目 俊秀
木村 将之
弓削 雅津也
井上 万里
池田 直樹
大石 知司
大井 暁彦
Alternative Title
Influence of Oxidant Gas of Atomic Layer Deposition on Electrical Characteristics of Al₂O₃ films
Periodical title
表面と真空 = Vacuum and surface science / 日本表面科学会, 日本真空学会 編
No. or year of volume/issue
61(5):2018.5
Volume
61
Issue
5