ファインバブル技術とその開発動向 : 半導体洗浄,ウェーハ搬送,植物工場等

Journal name: 電気学会誌 = The journal of the Institute of Electrical Engineers of Japan 138(7):2018.7

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Material Type: 記事
Title: ファインバブル技術とその開発動向 : 半導体洗浄,ウェーハ搬送,植物工場等
Author/Editor: 矢部彰
Author Heading: 矢部彰
Alternative Title: Fine Bubble Technology and its Current Stage of Development : Semiconductor Cleaning, Wafer Transfer, Plant Factory and Others
Periodical title: 電気学会誌 = The journal of the Institute of Electrical Engineers of Japan
No. or year of volume/issue: 138(7):2018.7
Volume: 138
Issue: 7
Pages: 430-434
Publication date of volume/issue (W3CDTF): 2018-07
ISSN (Periodical Title): 1340-5551
ISSN-L (Periodical Title): 1340-5551
Publication (Periodical Title): 東京 : 電気学会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: ファインバブル
ウルトラファインバブル
洗浄
生長促進
NDLC: ZN31
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-177
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 029122670
http://id.ndl.go.jp/bib/029122670
Bibliographic Record Category (NDL): 632