CoPtCrSiターゲットの酸素リアクティブスパッタリングによるCoPtCr–SiO₂グラニュラー薄膜の低ガス圧成膜
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- Material Type
- 記事
- Author/Editor
- 佐々木 晋五タム キムコング日向 慎太朗斉藤 伸
- Alternative Title
- Low–pressure Deposition of CoPtCr–SiO₂ Granular Films by Ar+O₂ Reactive Sputtering Using CoPtCrSi Target
- Periodical title
- 表面と真空 = Vacuum and surface science / 日本表面科学会, 日本真空学会 編
- No. or year of volume/issue
- 61(7):2018.7
- Volume
- 61
- Issue
- 7
- Pages
- 469-473