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Bibliographic Record
You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.
- Material Type
- 記事
- Author/Editor
- 久住 孝幸中村 竜太越後谷 正見
- Alternative Title
- Development of the advanced polishing technology for next-generation semiconductor substrates using controlled slurry under AC electric field(5)
- Periodical title
- 業務年報 = Annual report of Akita Industrial Technology Center / 秋田県産業技術センター 編
- No. or year of volume/issue
- 2017年度
- Pages
- 98-101
- Publication date of volume/issue (W3CDTF)
- 2017
- ISSN (Periodical Title)
- 2187-3380