リザーバ構造配線におけるボイドとヒロックの形成を考慮したエレクトロマイグレーション損傷しきい電流密度の評価

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Material Type: 記事
Title: リザーバ構造配線におけるボイドとヒロックの形成を考慮したエレクトロマイグレーション損傷しきい電流密度の評価
Author/Editor: 高谷降司
笹川和彦
藤崎和弘
森脇健司
Author Heading: 高谷降司
笹川和彦
藤崎和弘
森脇健司
Alternative Title: Evaluation of Threshold Current Density of Electromigration Damage Considering Formation of Void and Hillock in Reservoir Structure Line
Periodical title: マイクロエレクトロニクスシンポジウム論文集
No. or year of volume/issue: 28:2018.9.6・7
Volume: 28
Pages: 157-160
Publication date of volume/issue (W3CDTF): 2018-09
Publication (Periodical Title): 東京 : エレクトロニクス実装学会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN33
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-1617
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 029260626
http://id.ndl.go.jp/bib/029260626
Bibliographic Record Category (NDL): 632