ビスフェノールCとビス(メトキシメチル)ビフェニルを用いたノボラック樹脂の合成と性質 : ビスフェノール類に着眼した柔軟性をもつフォトレジスト材の開発

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Material Type: 記事
Title: ビスフェノールCとビス(メトキシメチル)ビフェニルを用いたノボラック樹脂の合成と性質 : ビスフェノール類に着眼した柔軟性をもつフォトレジスト材の開発
Author/Editor: 山﨑博人
安部春菜
藤井雄大
Author Heading: 山﨑博人
安部春菜
藤井雄大
Alternative Title: Synthesis and Properties of Bisphenol C-Bis(methoxymethyl)biphenyl Novolac Resin : Development of Photo-resist Material Having Flexibility Noticed with Bisphenol unit
Periodical title: Journal of network polymer, Japan = ネットワークポリマー論文集
No. or year of volume/issue: 41(4):2020
Volume: 41
Issue: 4
Pages: 148-156
Publication date of volume/issue (W3CDTF): 2020
ISSN (Periodical Title): 2433-3786
ISSN-L (Periodical Title): 2433-3786
Publication (Periodical Title): 東京 : 合成樹脂工業協会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: 2,2-Bis(4-hydroxy-3-methylphenyl) propane
4,4'-Bis(methoxymethyl)-1,1'-biphenyl
Pyrogallol
Flexibility
Photo-resist
NDLC: ZP17
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z17-845
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 030571684
http://id.ndl.go.jp/bib/030571684
Bibliographic Record Category (NDL): 632