低角度N⁺イオンビー...

低角度N⁺イオンビーム照射によるPTFE表面のCu薄膜付着性の改善

Icons representing 記事

低角度N⁺イオンビーム照射によるPTFE表面のCu薄膜付着性の改善

Call No. (NDL)
Z16-793
Bibliographic ID of National Diet Library
032951889
Material type
記事
Author
中山 芳隆ほか
Publisher
東京 : 電気学会
Publication date
2023-07
Material Format
Paper
Journal name
電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials 143(7):2023.7
Publication Page
p.244-250
View All

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

  • CiNii Research

    Search Service
    Paper
    You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper

Material Type
記事
Author/Editor
中山 芳隆
鷹野 一朗
Alternative Title
Improvement of Adhesiveness of Cu Films on a PTFE Surface Irradiated with Low-Angle N⁺ Ion Beam
Periodical title
電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials
No. or year of volume/issue
143(7):2023.7
Volume
143
Issue
7
Pages
244-250