Image formation in chemically amplified resists upon exposure to extreme ultraviolet radiation

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Image formation in chemically amplified resists upon exposure to extreme ultraviolet radiation

Call No. (NDL)
Z53-W515
Bibliographic ID of National Diet Library
10269916
Material type
記事
Author
Takahiro Kozawaほか
Publisher
Chiba : The Society of Photopolymer Science and Technology
Publication date
2009
Material Format
Paper
Journal name
Journal of photopolymer science and technology 22(1) 2009
Publication Page
p.51~58
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Paper Digital

Material Type
記事
Author/Editor
Takahiro Kozawa
Seiichi Tagawa
Periodical title
Journal of photopolymer science and technology
No. or year of volume/issue
22(1) 2009
Volume
22
Issue
1
Pages
51~58
Publication date of volume/issue (W3CDTF)
2009