五層非対称結合量子井戸の作製トレランスに関する理論検討 (レーザ・量子エレクトロニクス)

五層非対称結合量子井戸の作製トレランスに関する理論検討

(レーザ・量子エレクトロニクス)

Journal name: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報 109(93) 2009.6.19

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Material Type: 記事
Title: 五層非対称結合量子井戸の作製トレランスに関する理論検討
Author/Editor: 井芹有志
荒川太郎
多田邦雄他
Series Title: レーザ・量子エレクトロニクス
Author Heading: 井芹有志
荒川太郎
多田邦雄
Alternative Title: Theoretical study on fabrication tolerance of five-layer asymmetric coupled quantum well
Periodical title: 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
No. or year of volume/issue: 109(93) 2009.6.19
Volume: 109
Issue: 93
Pages: 1～6
Publication date of volume/issue (W3CDTF): 2009-06-19
ISSN (Periodical Title): 0913-5685
ISSN-L (Periodical Title): 0913-5685
Publication (Periodical Title): 東京 : 電子情報通信学会
Place of Publication (Country Code): JP
Text Language Code: jpn
Subject Heading: 量子井戸
五層非対称結合量子井戸
InGaAs
ヘテロ界面
電界誘起屈折率変化
Quantum Well
Five-Layer Asymmetric Coupled Quantum Well
Heterointerface Abruptness
Electrorefractive effect
NDLC: ZN33
Target Audience: 一般
Report No. (Article): LQE2009-19
Holding library: 国立国会図書館
Call No.: Z16-940
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 10276405
http://id.ndl.go.jp/bib/10276405
Bibliographic Record Category (NDL): 632