Nanomechanical response of the Si lattice to hydrogen implantation and annealing for layer splitting

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Nanomechanical response of the Si lattice to hydrogen implantation and annealing for layer splitting

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
10406663
Material type
記事
Author
Diefeng Guほか
Publisher
Tokyo : The Japan Society of Applied Physics
Publication date
2009-10
Material Format
Digital
Journal name
Japanese journal of applied physics : JJAP 48(10) 2009.10
Publication Page
p.101202-1~4
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Detailed bibliographic record

Summary, etc.:

コレクション : 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌(Provided by: CiNii Research)

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Diefeng Gu
Helmut Baumgart
Konstantin K. Bourdelle 他
Periodical title
Japanese journal of applied physics : JJAP
No. or year of volume/issue
48(10) 2009.10
Volume
48
Issue
10
Pages
101202-1~4
Publication date of volume/issue (W3CDTF)
2009-10