Progress of resist materials and process for hp 2x-nm devices using EUV lithography
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- Material Type
- 記事
- Author/Editor
- Kentaro MatsunagaHiroaki OizumiKoji Kaneyama 他
- Author Heading
- Periodical title
- Journal of photopolymer science and technology
- No. or year of volume/issue
- 23(5) 2010
- Volume
- 23
- Issue
- 5
- Pages
- 613～618
- Publication date of volume/issue (W3CDTF)
- 2010