半導体・液晶プロセスにおける干渉計測の応用 (特集光干渉計測最新動向)

半導体・液晶プロセスにおける干渉計測の応用

(特集光干渉計測最新動向)

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Material Type: 記事
Title: 半導体・液晶プロセスにおける干渉計測の応用
Author/Editor: 北川克一
Series Title: 特集光干渉計測最新動向
Author Heading: 北川克一
Alternative Title: Recent progress in interferometric surface profiling technology and its applications in semiconductor and LCD processes
Periodical title: Optronics : 光技術コーディネートジャーナル
No. or year of volume/issue: 29(8) (通号 344) 2010.8
Volume: 29
Issue: 8
Sequential issue number: 344
Pages: 117～123
Publication date of volume/issue (W3CDTF): 2010-08
ISSN (Periodical Title): 0286-9659
ISSN-L (Periodical Title): 0286-9659
Publication (Periodical Title): 東京 : オプトロニクス社
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN33
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-1255
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 10784252
http://id.ndl.go.jp/bib/10784252
Bibliographic Record Category (NDL): 632