Etching characteristics and mechanism of ZnO and Ga-doped ZnO thin films in inductively coupled HBr/Ar/CHF3 plasma (Special issue: Dry process)
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- Material Type
- 記事
- Author/Editor
- Yong-Hyun HamAlexander EfremovHyun-Woo Lee 他
- Series Title
- Author Heading
- Periodical title
- Japanese journal of applied physics : JJAP
- No. or year of volume/issue
- 49(8) (2) 2010.8
- Volume
- 49
- Issue
- 8
- Other Volume
- 2