Study of Si3N4/SiO2/Si and SiO2/Si3N4/Si multilayers by O and N K-edge X-ray absorption spectroscopy (Special issue: Dry process)

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Study of Si3N4/SiO2/Si and SiO2/Si3N4/Si multilayers by O and N K-edge X-ray absorption spectroscopy(Special issue: Dry process)

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
10793907
Material type
記事
Author
Youn-Seoung Leeほか
Publisher
Tokyo : The Japan Society of Applied Physics
Publication date
2010-08
Material Format
Digital
Journal name
Japanese journal of applied physics : JJAP 49(8) (2) 2010.8
Publication Page
p.08JF05-1~4
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Digital

Material Type
記事
Author/Editor
Youn-Seoung Lee
Won-Jun Lee
Sung-Kyu Kang 他
Periodical title
Japanese journal of applied physics : JJAP
No. or year of volume/issue
49(8) (2) 2010.8
Volume
49
Issue
8
Other Volume
2