Improvement of thickness uniformity of silicon on insulator layer by numerically controlled sacrificial oxidation using atmospheric-pressure plasma with electrode array system (Special issue: Dry process)
Available with Digitized Contents Transmission Service
NDL Digital Collections
Available for viewing via the Digitized Contents Transmission Service for Individuals to official registered users of the NDL, who resides in Japan.
Holdings of Libraries in Japan
This page shows libraries in Japan other than the National Diet Library that hold the material.
Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.
other
CiNii Research
Search ServiceYou can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.
Bibliographic Record
You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.
- Material Type
- 記事
- Author/Editor
- Shohei KamisakaKeinosuke YoshinagaYasuhisa Sano 他
- Series Title
- Author Heading
- Periodical title
- Japanese journal of applied physics : JJAP
- No. or year of volume/issue
- 49(8) (2) 2010.8
- Volume
- 49
- Issue
- 8
- Other Volume
- 2