High-density radio-frequency plasma sources produced by capacitive discharge with various methods for thin-film preparation (特集 日本のプラズマ研究最前線)

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High-density radio-frequency plasma sources produced by capacitive discharge with various methods for thin-film preparation(特集 日本のプラズマ研究最前線)

Call No. (NDL)
Z16-793
Bibliographic ID of National Diet Library
10830838
Material type
記事
Author
Yasunori Ohtsu
Publisher
東京 : 電気学会
Publication date
2010-10
Material Format
Paper
Journal name
電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials 130(10) 2010.10
Publication Page
p.865~870
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Paper Digital

Material Type
記事
Author/Editor
Yasunori Ohtsu
Author Heading
Periodical title
電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials
No. or year of volume/issue
130(10) 2010.10
Volume
130
Issue
10
Pages
865~870