ハーフトーンマスク用...

ハーフトーンマスク用二層レジスト技術の開発

Icons representing 記事

ハーフトーンマスク用二層レジスト技術の開発

Call No. (NDL)
Z17-92
Bibliographic ID of National Diet Library
10844225
Material type
記事
Author
山本 雅史ほか
Publisher
東京 : 高分子学会
Publication date
2010
Material Format
Paper
Journal name
高分子論文集 = Japanese journal of polymer science and technology 67(9) 2010
Publication Page
p.506~510
View All

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

  • CiNii Research

    Search Service
    Digital
    You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper Digital

Material Type
記事
Author/Editor
山本 雅史
加藤 大輝
河野 昭彦 他
Alternative Title
Development of two-layer resist technology for the halftone mask
Periodical title
高分子論文集 = Japanese journal of polymer science and technology
No. or year of volume/issue
67(9) 2010
Volume
67
Issue
9
Pages
506~510