雑誌電気学会論文誌 A 基礎・材料・共通部門誌
Volume number130(7)-130(12):2010.7-2010.12
Article半導体露光装置用Ar...

半導体露光装置用ArFエキシマレーザの高繰返しグロー放電に及ぼす放電幅とガス密度くぼみの影響

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半導体露光装置用ArFエキシマレーザの高繰返しグロー放電に及ぼす放電幅とガス密度くぼみの影響

Call No. (NDL)
Z16-793
Bibliographic ID of National Diet Library
10895207
Material type
記事
Author
石原 孝信ほか
Publisher
東京 : 電気学会
Publication date
2010-12
Material Format
Paper
Journal name
電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials 130(12) 2010.12
Publication Page
p.1060～1066
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Material Type
記事
Title
半導体露光装置用ArFエキシマレーザの高繰返しグロー放電に及ぼす放電幅とガス密度くぼみの影響
Author/Editor
石原 孝信
堀 司
柿崎 弘司 他
Author Heading
石原 孝信
堀 司
柿崎 弘司
Alternative Title
Influence of widths of discharge and gas density depletion on high repetition glow discharges in an ArF excimer laser for microlithography
Periodical title
電気学会論文誌. A, 基礎・材料・共通部門誌 = IEEJ transactions on fundamentals and materials
No. or year of volume/issue
130(12) 2010.12
Volume
130
Issue
12
Pages
1060～1066