Non-contact wafer fabrication process using gas cluster ion beams

Journal name: 兵庫県立大学工学研究科イオン工学研究室論文集 = Annual report of Ion Beam Engineering Laboratory, University of Hyogo 2009年度

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Material Type: 記事
Title: Non-contact wafer fabrication process using gas cluster ion beams
Author/Editor: 豊田紀章
磯貝宏道
山田公
Author Heading: 豊田紀章
磯貝宏道
山田公
Periodical title: 兵庫県立大学工学研究科イオン工学研究室論文集 = Annual report of Ion Beam Engineering Laboratory, University of Hyogo
No. or year of volume/issue: 2009年度
Volume: 2009年度
Pages: 82～84
Publication date of volume/issue (W3CDTF): 2009
Publication (Periodical Title): 姫路 : 兵庫県立大学工学研究科イオン工学研究室
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: Gas cluster ion
reactive sputtering
location specific processing
wafer process
NDLC: ZP5
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z74-E130
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 10917864
http://id.ndl.go.jp/bib/10917864
Bibliographic Record Category (NDL): 632