Material innovations for 193-nm resists

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Material Type: 記事
Title: Material innovations for 193-nm resists
Author/Editor: Koji Nozaki
Author Heading: Koji Nozaki
Periodical title: Journal of photopolymer science and technology
No. or year of volume/issue: 23(6) 2010
Volume: 23
Issue: 6
Pages: 795～801
Publication date of volume/issue (W3CDTF): 2010
ISSN (Periodical Title): 0914-9244
ISSN-L (Periodical Title): 0914-9244
Publication (Periodical Title): Chiba : The Society of Photopolymer Science and Technology
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: 193-nm resist
alicyclic methacrylate
adamantane
lactone
NDLC: ZP48
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z53-W515
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 10923363
http://id.ndl.go.jp/bib/10923363
Bibliographic Record Category (NDL): 632