EUV露光装置の将来動向 (特集次世代リソグラフィ,注目の技術)

EUV露光装置の将来動向

(特集次世代リソグラフィ,注目の技術)

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Material Type: 記事
Title: EUV露光装置の将来動向
Author/Editor: 村上勝彦
Series Title: 特集次世代リソグラフィ,注目の技術
Author Heading: 村上勝彦
Alternative Title: Future prospects of EUV exposure tools
Periodical title: Optronics : 光技術コーディネートジャーナル
No. or year of volume/issue: 29(12) (通号 348) 2010.12
Volume: 29
Issue: 12
Sequential issue number: 348
Pages: 80～84
Publication date of volume/issue (W3CDTF): 2010-12
ISSN (Periodical Title): 0286-9659
ISSN-L (Periodical Title): 0286-9659
Publication (Periodical Title): 東京 : オプトロニクス社
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN33
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-1255
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 10931005
http://id.ndl.go.jp/bib/10931005
Bibliographic Record Category (NDL): 632