Volume number31(12) 2010.12
極薄Si酸化膜を用い...

極薄Si酸化膜を用いたエピタキシャル量子ドット二次元ナノ配列構造の自己組織化と自己修復 (特集 新ヘテロ界面の実現に向けた半導体結晶成長技術の進展)

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極薄Si酸化膜を用いたエピタキシャル量子ドット二次元ナノ配列構造の自己組織化と自己修復(特集 新ヘテロ界面の実現に向けた半導体結晶成長技術の進展)

Call No. (NDL)
Z15-379
Bibliographic ID of National Diet Library
10934828
Material type
記事
Author
中村 芳明ほか
Publisher
東京 : 日本表面科学会
Publication date
2010-12
Material Format
Paper
Journal name
表面科学 = Journal of the Surface Science Society of Japan / 日本表面科学会 編 31(12) 2010.12
Publication Page
p.626~631
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Paper Digital

Material Type
記事
Author/Editor
中村 芳明
村山 昭之
渡邉 亮子 他
Alternative Title
Self-organization and self-repair of a two-dimensional nanoarray of Ge quantum dots epitaxially grown on Si substrates using ultrathin SiO2 films
Periodical title
表面科学 = Journal of the Surface Science Society of Japan / 日本表面科学会 編
No. or year of volume/issue
31(12) 2010.12
Volume
31
Issue
12