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Bibliographic Record
You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.
- Material Type
- 記事
- Author/Editor
- 渡辺 晃次須田 健一仲田 英起 他
- Series Title
- Alternative Title
- Effect of H2-N2 plasma exposure on nanostructured silicon
- Periodical title
- 電子情報通信学会技術研究報告 = IEICE technical report : 信学技報
- No. or year of volume/issue
- 110(351) 2010.12.17
- Volume
- 110
- Issue
- 351