Pr(EtCp)3を用いた原子層成長法によるPr酸化膜の作製とその電気的特性(小特集真空を利用した材料プロセスの新展開--化学気相成長から原子層成長へ)

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Material Type: 記事
Title: Pr(EtCp)3を用いた原子層成長法によるPr酸化膜の作製とその電気的特性
Author/Editor: 近藤博基
坂下満男
財満鎭明
Series Title: 小特集真空を利用した材料プロセスの新展開--化学気相成長から原子層成長へ
Author Heading: 近藤博基
坂下満男
財満鎭明
Alternative Title: Growth of Pr oxide films by atomic layer deposition using Pr(EtCp)3, and their electrical properties
Periodical title: Journal of the Vacuum Society of Japan = 真空
No. or year of volume/issue: 54(2) 2011.2
Volume: 54
Issue: 2
Pages: 110～113
Publication date of volume/issue (W3CDTF): 2011-02
ISSN (Periodical Title): 1882-2398
ISSN-L (Periodical Title): 1882-2398
Publication (Periodical Title): 東京 : 日本真空協会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN15
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-474
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 11029582
http://id.ndl.go.jp/bib/11029582
Bibliographic Record Category (NDL): 632