シリコンにおける熱酸化積層欠陥の1200℃以上での成長と縮小

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Material Type: 記事
Title: シリコンにおける熱酸化積層欠陥の1200℃以上での成長と縮小
Author/Editor: 福森太一郎
松永邦義
小佐井昭
Author Heading: 福森太一郎
松永邦義
小佐井昭
Periodical title: 宮崎大学工学部研究報告 / 宮崎大学工学部編
No. or year of volume/issue: (通号 26) 1980.09
Sequential issue number: 26
Pages: p83～85
Publication date of volume/issue (W3CDTF): 1980-09
ISSN (Periodical Title): 0540-4932
ISSN-L (Periodical Title): 0540-4932
Publication (Periodical Title): 宮崎 : 宮崎大学工学部
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZM2
Target Audience: 一般
Article Type: 記事分類: 物理学--分子・物性--結晶
Holding library: 国立国会図書館
Call No.: Z14-150
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 2193613
http://id.ndl.go.jp/bib/2193613
Bibliographic Record Category (NDL): 632