高性能シリコンLSI用結晶技術の現状と将来 (シリコンLSIの高性能化技術特集)

高性能シリコンLSI用結晶技術の現状と将来

(シリコンLSIの高性能化技術特集)

Journal name: 電子情報通信学会論文誌. C-2, エレクトロニクス. 2, 電子素子・応用 = The Transactions of the Institute of Electronics, Information and Communication Engineers. C-2 / 電子情報通信学会編 72(5) 1989.05

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Material Type: 記事
Title: 高性能シリコンLSI用結晶技術の現状と将来
Author/Editor: 津屋英樹
Series Title: シリコンLSIの高性能化技術特集
Author Heading: 津屋英樹
Periodical title: 電子情報通信学会論文誌. C-2, エレクトロニクス. 2, 電子素子・応用 = The Transactions of the Institute of Electronics, Information and Communication Engineers. C-2 / 電子情報通信学会編
No. or year of volume/issue: 72(5) 1989.05
Volume: 72
Issue: 5
Pages: p320～331
Publication date of volume/issue (W3CDTF): 1989-05
ISSN (Periodical Title): 0915-1907
ISSN-L (Periodical Title): 0915-1907
Publication (Periodical Title): 東京 : 電子情報通信学会エレクトロニクスソサイエティ
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN33
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-1852
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 3233041
http://id.ndl.go.jp/bib/3233041
Bibliographic Record Category (NDL): 632