低出力Arイオン照射前処理によるTi薄膜/Si基板間の密着性の改善

Journal name: 表面技術 = Journal of the Surface Finishing Society of Japan 47(10) 1996.10

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Material Type: 記事
Title: 低出力Arイオン照射前処理によるTi薄膜/Si基板間の密着性の改善
Author/Editor: 近藤市治
近藤憲司
竹中修他
Author Heading: 近藤市治
近藤憲司
竹中修
Periodical title: 表面技術 = Journal of the Surface Finishing Society of Japan
No. or year of volume/issue: 47(10) 1996.10
Volume: 47
Issue: 10
Pages: 858～862
Publication date of volume/issue (W3CDTF): 1996-10
ISSN (Periodical Title): 0915-1869
ISSN-L (Periodical Title): 0915-1869
Publication (Periodical Title): 東京 : 表面技術協会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZP41
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z17-291
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 4057355
http://id.ndl.go.jp/bib/4057355
Bibliographic Record Category (NDL): 632