Yield Measurement of Secondary Electrons Emitted from Silicon Dioxide Film in Negative-Ion Bombardment

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Yield Measurement of Secondary Electrons Emitted from Silicon Dioxide Film in Negative-Ion Bombardment

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
4060168
Material type
記事
Author
Yoshitaka Toyotaほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
1996-09
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 35(9A) 1996.09
Publication Page
p.4785~4788
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Detailed bibliographic record

Summary, etc.:

The yield of secondary electrons emitted from insulating materials subjected to negative-ion bombardment was studied. In general, such measurements fo...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Yoshitaka Toyota
Hiroshi Tsuji
Yasuhito Gotoh
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
35(9A) 1996.09
Volume
35
Issue
9A
Pages
4785~4788
Publication date of volume/issue (W3CDTF)
1996-09