Indium Doped nMOSFETs and Buried Channel pMOSFETs with n+ Polysilicon Gate (Solid State Devices and Materials)

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Indium Doped nMOSFETs and Buried Channel pMOSFETs with n+ Polysilicon Gate(Solid State Devices and Materials)

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
4196623
Material type
記事
Author
Yeong-Taek Leeほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
1997-03
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 36(3B) 1997.03
Publication Page
p.1341~1345
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Digital

Material Type
記事
Author/Editor
Yeong-Taek Lee
Ki-Whan Song
Byung-Gook Park 他
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
36(3B) 1997.03
Volume
36
Issue
3B
Pages
1341~1345