Excimer Laser Induced Crystallization of Polycrystalline Silicon Films by Adding Oxygen (Solid State Devices and Materials)

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Excimer Laser Induced Crystallization of Polycrystalline Silicon Films by Adding Oxygen(Solid State Devices and Materials)

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
4196650
Material type
記事
Author
Hong-Seok Choiほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
1997-03
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 36(3B) 1997.03
Publication Page
p.1473~1476
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Digital

Material Type
記事
Author/Editor
Hong-Seok Choi
Jae-Hong Jun
Cheol-Min Park 他
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
36(3B) 1997.03
Volume
36
Issue
3B
Pages
1473~1476