Characterization of Dopant Interdiffusion and Power Reduction on TiSi2 Local Wiring Technology in Sub-Half-Micron Complementary Metal Oxide Semiconductor
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- Material Type
- 記事
- Author/Editor
- Jiro IdaAtsushi Ohtomo
- Author Heading
- Periodical title
- Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
- No. or year of volume/issue
- 37(4A) 1998.04
- Volume
- 37
- Issue
- 4A
- Pages
- 1674～1679
- Publication date of volume/issue (W3CDTF)
- 1998-04