Thin CoSi2 Formation on SiO2 with Low-Energy Ion Irradiation

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Thin CoSi2 Formation on SiO2 with Low-Energy Ion Irradiation

Call No. (NDL): Z53-A375
Bibliographic ID of National Diet Library: 4621650

Material type: 記事

Author: Atsushi Matsushitaほか

Publisher: Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

Publication date: 1998-11

Material Format: Digital

Journal name: Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 37(11) 1998.11

Publication Page: p.6117～6122

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Detailed bibliographic record

Summary, etc.：: Cobalt silicides were formed by heat treatment and ion irradiation for stacked 7 nm Co and 25 nm Si layers on 20 nm SiO<SUB>2</SUB> films. Irradiation...

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Material Type: 記事
Title: Thin CoSi2 Formation on SiO2 with Low-Energy Ion Irradiation
Author/Editor: Atsushi Matsushita
Taizoh Sadoh
Toshio Tsurushima
Author Heading: Atsushi Matsushita
Taizoh Sadoh
Toshio Tsurushima
Periodical title: Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue: 37(11) 1998.11
Volume: 37
Issue: 11
Pages: 6117～6122
Publication date of volume/issue (W3CDTF): 1998-11
ISSN (Periodical Title): 0021-4922
ISSN-L (Periodical Title): 0021-4922
Publication (Periodical Title): Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: ZM35
Target Audience: 一般
Collection (particular): 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌
https://dl.ndl.go.jp/collections/A00002
Access Restrictions: 国立国会図書館内限定公開
Service for the Digitized Contents Transmission Service: 図書館・個人送信対象
Availability of remote photoduplication service: 可
Holding library: 国立国会図書館
Call No.: Z53-A375
Periodical Title (Persistent ID (NDL)): info:ndljp/pid/11226577
https://dl.ndl.go.jp/pid/11226577
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 4621650
http://id.ndl.go.jp/bib/4621650
Bibliographic Record Category (NDL): 632