Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100nm Resolution

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Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100nm Resolution

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
4713268
Material type
記事
Author
Shunko Magoshiほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
1999-04
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 38(4A) (通号 497) 1999.04
Publication Page
p.2169~2172
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Detailed bibliographic record

Summary, etc.:

We have developed a novel electron-beam (e-beam)/deep-ultraviolet (DUV) intralevel mix-and-match (ILM&M) lithography as a production-viable technology...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Shunko Magoshi
Hiromi Niiyama
Shinji Sato 他
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
38(4A) (通号 497) 1999.04
Volume
38
Issue
4A
Sequential issue number
497
Pages
2169~2172