XeClエキシマレーザーによるポリシリコンTFTアニーリング(「最近のレーザー加工」特集号)

Journal name: レーザー研究 = The review of laser engineering : レーザー学会誌 / レーザー学会編 28(1) 2000.01

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Material Type: 記事
Title: XeClエキシマレーザーによるポリシリコンTFTアニーリング
Author/Editor: 次田純一
小林直之
草間秀晃
Series Title: 「最近のレーザー加工」特集号
Author Heading: 次田純一
小林直之
草間秀晃
Periodical title: レーザー研究 = The review of laser engineering : レーザー学会誌 / レーザー学会編
No. or year of volume/issue: 28(1) 2000.01
Volume: 28
Issue: 1
Pages: 24～28
Publication date of volume/issue (W3CDTF): 2000-01
ISSN (Periodical Title): 0387-0200
ISSN-L (Periodical Title): 0387-0200
Publication (Periodical Title): 吹田 : レーザー学会
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: ZN33
Target Audience: 一般
Holding library: 国立国会図書館
Call No.: Z16-1040
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 4967046
http://id.ndl.go.jp/bib/4967046
Bibliographic Record Category (NDL): 632