Characterization of Residues on Anhydrous HF Gas-Phase Etching of Sacrificial Oxides for Surface Micromachining

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Characterization of Residues on Anhydrous HF Gas-Phase Etching of Sacrificial Oxides for Surface Micromachining

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
4975096
Material type
記事
Author
Won Ick Jangほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
2000-01
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 39(1) (通号 512) 2000.01
Publication Page
p.337~342
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Detailed bibliographic record

Summary, etc.:

We employed a newly developed anhydrous HF gas-phase etching (GPE) process for the removal of sacrificial oxides. The structural layers are P-doped mu...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Won Ick Jang
Chang Auck Choi
Jong Hyun Lee 他
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
39(1) (通号 512) 2000.01
Volume
39
Issue
1
Sequential issue number
512
Pages
337~342