SPD法によるTiO2薄膜の形成と表面形態制御の試み (SPD法による化合物半導体薄膜の形成)
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- Material Type
- 記事
- Author/Editor
- 奥谷 昌之
- Series Title
- Author Heading
- Periodical title
- 機能材料
- No. or year of volume/issue
- 20(3) (通号 223) 2000.03
- Volume
- 20
- Issue
- 3
- Sequential issue number
- 223