Fabrication of Polycrystalline Silicon Films from SiF4/H2/SiH4 Gas Mixture Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties

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Fabrication of Polycrystalline Silicon Films from SiF4/H2/SiH4 Gas Mixture Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties

Call No. (NDL): Z53-A375
Bibliographic ID of National Diet Library: 5382674

Material type: 記事

Author: Kouichi Nakahataほか

Publisher: Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

Publication date: 2000-06

Material Format: Digital

Journal name: Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 39(6A) (通号 521) 2000.06

Publication Page: p.3294～3301

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Detailed bibliographic record

Summary, etc.：: Polycrystalline silicon (<I>poly</I>-Si) films were fabricated by very high frequency (VHF) plasma enhanced (PE) chemical vapor deposition (CVD) from ...

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Material Type: 記事
Title: Fabrication of Polycrystalline Silicon Films from SiF4/H2/SiH4 Gas Mixture Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties
Author/Editor: Kouichi Nakahata
kazuyoshi Ro
Atsushi Suemasu 他
Author Heading: Kouichi Nakahata
kazuyoshi Ro
Atsushi Suemasu
Periodical title: Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue: 39(6A) (通号 521) 2000.06
Volume: 39
Issue: 6A
Sequential issue number: 521
Pages: 3294～3301
Publication date of volume/issue (W3CDTF): 2000-06
ISSN (Periodical Title): 0021-4922
ISSN-L (Periodical Title): 0021-4922
Publication (Periodical Title): Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Place of Publication (Country Code): JP
Text Language Code: eng
Subject Heading: optical emission spectroscopy
low-temperature growth
microstructure
NDLC: ZM35
Target Audience: 一般
Collection (particular): 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌
https://dl.ndl.go.jp/collections/A00002
Access Restrictions: 国立国会図書館内限定公開
Service for the Digitized Contents Transmission Service: 図書館・個人送信対象
Availability of remote photoduplication service: 可
Holding library: 国立国会図書館
Call No.: Z53-A375
Periodical Title (Persistent ID (NDL)): info:ndljp/pid/11196219
https://dl.ndl.go.jp/pid/11196219
Data Provider (Database): 国立国会図書館 : 国立国会図書館雑誌記事索引
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 5382674
http://id.ndl.go.jp/bib/5382674
Bibliographic Record Category (NDL): 632