Amorphous-to-Polycrystalline Silicon Transition in Hot Wire Cell Method

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Amorphous-to-Polycrystalline Silicon Transition in Hot Wire Cell Method

Call No. (NDL)
Z53-A375
Bibliographic ID of National Diet Library
5501341
Material type
記事
Author
Mitsuru Ichikawaほか
Publisher
Tokyo : Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics
Publication date
2000-08
Material Format
Digital
Journal name
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP 39(8) (通号 525) 2000.8
Publication Page
p.4712~4715
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Detailed bibliographic record

Summary, etc.:

Hot Wire Cell method has been newly developed and successfully applied to grow polycrystalline silicon films at a low temperature with a relatively hi...

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Bibliographic Record

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Digital

Material Type
記事
Author/Editor
Mitsuru Ichikawa
Takeshi Tsushima
Akira Yamada 他
Periodical title
Japanese journal of applied physics. Part. 1, Regular papers, brief communications & review papers : JJAP
No. or year of volume/issue
39(8) (通号 525) 2000.8
Volume
39
Issue
8
Sequential issue number
525
Pages
4712~4715