極薄ゲート酸化膜絶縁破壊機構の解明と新高信頼化成膜プロセスの提案
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- Material Type
- 記事
- Author/Editor
- 佐竹 秀喜三谷 祐一郎
- Periodical title
- 東芝レビュー = Toshiba review / 東芝ビジネスエキスパート株式会社ビジネスソリューション事業部 編集・制作
- No. or year of volume/issue
- 55(10) (通号 616) 2000.10
- Volume
- 55
- Issue
- 10
- Sequential issue number
- 616
- Pages
- 58～61